1 - 10 of 12 Results
A pressure burst feature has been designed and demonstrated for relieving potentially hazardous excess pressure within irradiation capsules used in the ORNL High Flux Isotope Reactor (HFIR).
Sintering additives to improve densification and microstructure control of UN provides a facile approach to producing high quality nuclear fuels.
High coercive fields prevalent in wurtzite ferroelectrics present a significant challenge, as they hinder efficient polarization switching, which is essential for microelectronic applications.
This technology is a laser-based heating unit that offers rapid heating profiles on a research scale with minimal incidental heating of materials processing environments.
In order to avoid the limitations and costs due to the use of monolithic components for chemical vapor deposition, we developed a modular system in which the reaction chamber can be composed of a top and bottom cone, nozzle, and in-situ reaction chambers.
Molecular Beam Epitaxy is a traditional technique for the synthesis of thin film materials used in the semiconducting and microelectronics industry. In its essence, the MBE technique heats crucibles filled with ultra-pure atomic elements under ultra high vacuum condition
The use of Fluidized Bed Chemical Vapor Deposition to coat particles or fibers is inherently slow and capital intensive, as it requires constant modifications to the equipment to account for changes in the characteristics of the substrates to be coated.
A novel molecular sorbent system for low energy CO2 regeneration is developed by employing CO2-responsive molecules and salt in aqueous media where a precipitating CO2--salt fractal network is formed, resulting in solid-phase formation and sedimentation.