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Researcher
- Alex Plotkowski
- Amit Shyam
- Kyle Kelley
- Rama K Vasudevan
- James A Haynes
- Sergei V Kalinin
- Sumit Bahl
- Alice Perrin
- Andres Marquez Rossy
- Anton Ievlev
- Bogdan Dryzhakov
- Gerald Tuskan
- Gerry Knapp
- Ilenne Del Valle Kessra
- Jovid Rakhmonov
- Kevin M Roccapriore
- Liam Collins
- Marti Checa Nualart
- Maxim A Ziatdinov
- Neus Domingo Marimon
- Nicholas Richter
- Olga S Ovchinnikova
- Paul Abraham
- Peeyush Nandwana
- Ryan Dehoff
- Stephen Jesse
- Steven Randolph
- Sunyong Kwon
- Xiaohan Yang
- Yang Liu
- Ying Yang
- Yongtao Liu

Currently available cast Al alloys are not suitable for various high-performance conductor applications, such as rotor, inverter, windings, busbar, heat exchangers/sinks, etc.

The invented alloys are a new family of Al-Mg alloys. This new family of Al-based alloys demonstrate an excellent ductility (10 簣 2 % elongation) despite the high content of impurities commonly observed in recycled aluminum.

The invention introduces a novel, customizable method to create, manipulate, and erase polar topological structures in ferroelectric materials using atomic force microscopy.

High coercive fields prevalent in wurtzite ferroelectrics present a significant challenge, as they hinder efficient polarization switching, which is essential for microelectronic applications.

Detection of gene expression in plants is critical for understanding the molecular basis of plant physiology and plant responses to drought, stress, climate change, microbes, insects and other factors.

This invention presents technologies for characterizing physical properties of a sample's surface by combining image processing with machine learning techniques.

This invention introduces a system for microscopy called pan-sharpening, enabling the generation of images with both full-spatial and full-spectral resolution without needing to capture the entire dataset, significantly reducing data acquisition time.

A high-strength, heat-resistant Al-Ce-Ni alloy optimized for additive manufacturing in industrial applications.